AIXTRON - SYSTEM PRODUCTION WITH ATTENTION TO DETAIL
To date, AIXTRON has delivered more than 3,000 deposition systems to customers around the world. We have also enhanced existing technologies and take pride that our comprehensive expertise and many years of experience in the deposition of complex semiconductor materials have served as a foundation for many of customers’ success.
The best reactor for HVM of GaAs/InP based Optoelectronics and RF applications
System detailsSiC VPE reactor with single wafer performance and batch reactor cost benefit
System detailsState-of-the-art Planetary reactor module increases productivity and wafer performance
System detailsMOCVD-system for R&D and small batch production
System detailsFully Automated MOCVD for High Volume Production of GaAs/InP Materials
System details150/200 mm high throughput epitaxy for GaN power & RF applications
System details150/200 mm High Throughput Epitaxy for SiC Power Electronics Dual Wafer Size Batch Reactor
System detailsProdukte
Managing Director
Senior Product Manager
Vice President Silicon Carbide
Alan Tai
Taiwan/Singapore
Christof Sommerhalter
USA
Christian Geng
Europe
Hisatoshi Hagiwara
Japan
Nam Kyu Lee
South Korea
Wei (William) Song
China
AIXTRON SE (Headquarters)
AIXTRON 24/7 Technical Support Line
AIXTRON Europe
AIXTRON Ltd (UK)
AIXTRON K.K. (Japan)
AIXTRON Korea Co., Ltd.
AIXTRON Taiwan Co., Ltd. (Main Office)
AIXTRON Inc. (USA)
Laura Preinich
Recruiter
Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung
Christoph Pütz
Senior Manager ESG & Sustainability
Carsten Werle
Director Investor Relations (Interim)
Ragah Dorenkamp
Director Corporate Communications
Prof. Dr. Michael Heuken
Vice President Advanced Technologies
